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Student Number 943203031
Author Yi-chun WU(吳俊逸)
Author's Email Address 943203031@cc.ncu.edu.tw
Statistics This thesis had been viewed 1771 times. Download 1146 times.
Department Mechanical Engineering
Year 2006
Semester 2
Degree Master
Type of Document Master's Thesis
Language zh-TW.Big5 Chinese
Title Thermally-Formed Oxide on Al-XMg(X=2,4wt%) Alloys in different atmosphere
Date of Defense 2007-07-06
Page Count 96
Keyword
  • AlN and Mg3N2
  • spinel
  • thermal oxide film
  • Abstract The purpose of this study is analyzing the thermal-formed oxide on aluminum and magnesium alloys. Two materials, Al-2wt%Mg、Al-4wt%Mg were used in this study. The cube samples were prepared in 10 mm × 10 mm × 6 mm. They were then polished by #400, #800, #1200, #1500 and #2000 abrasive paper. These cube samples were moved to the muffle furnace in the air and nitrogen separately and then heated to 500℃ and hold on for 1 hr,6hrs,25hrs.
    The experimental result find that the magnesium oxide and Gibbs-free energy are lower than the alumina, and the oxide film gradually is rich in oxygen and magnesium, the surface oxide layer which almost entirely magnesium oxide, so Al-Mg alloy oxide film is mainly the magnesium oxide for heating of air. The Al-2wt%Mg thermal oxide film appearance with alumina, MgO, MgAl2O4 spinel, and MgO appeared first on the surface of the sample and followed by formation MgAl2O4 spinel. The Al-2wt%Mg thermal oxide film doesn’t observe MgAl2O4 spinel, to transform MgAl2O4 spinel is depend on the content of Mg of Al-Mg alloy.
    When Al-Mg alloy heat in the nitrogen, the surface is formed aluminum nitride and magnesium nitride, Mg react with nitrogen to form Mg3N2, then react and form AlN with aluminum. Formulation amount of the AlN is related to content of Mg of Al-Mg alloy. During long heat of time with nitrogen, the deleterious effect of oxygen impurities is due to its inhibition to the chemisorbtion of N2 molecules, then Mg3N2 and AlN transform to MgO and Al2O3 separately.
    Table of Content 中文摘要……………………………………………………………I
    Abstract……………………………………………………………II
    總目錄………………………………………………………………III
    表目錄………………………………………………………………VI
    圖目錄………………………………………………………………VII
    第一章 前言………………………………………………………1
    第二章 文獻回顧…………………………………………………2
    2.1 鋁合金的簡述…………………………………………………2
    2.1.1 鋁合金的類型………………………………………………2
    2.1.2 鑄造用鋁合金的分類………………………………………2
    2.1.3 純鋁(1XX.X)………………………………………………3
    2.1.4 影響熔湯表面張力的元素…………………………………3
    2.2 氧化鋁的生成…………………………………………………3
    2.2.1 氧化鋁的種類………………………………………………3
    2.2.2 氧化鋁的形成………………………………………………5
    2.2.3 化學分析電子儀(ESCA)診斷氧化鋁膜……………………7
    2.3 鋁鎂合金………………………………………………………8
    2.3.1 鋁鎂(5XX.X)………………………………………………8
    2.3.2鋁鎂合金特性………………………………………………8
    2.3.3 鎂元素對鋁合金的影響……………………………………9
    2.4 氮化鋁的生成…………………………………………………9
    2.4.1 氮化鋁的結構與特性………………………………………9
    2.4.2 氮化鋁的形成………………………………………………10
    2.5 MgAl2O4的生成………………………………………………11
    2.5.1 MgAl2O4的結構與特性……………………………………11
    2.5.2 MgAl2O4的形成……………………………………………12
    2.6 表面吸附………………………………………………………12
    2.6.1 物理吸附與化學吸附………………………………………12
    2.6.2 氮氣與氧氣在表面吸附的情形……………………………13
    第三章 實驗方法與步驟…………………………………………14
    3.1 實驗目的………………………………………………………14
    3.2 實驗材料………………………………………………………14
    3.2.1 鋁鎂合金……………………………………………………14
    3.3 試片規格………………………………………………………14
    3.4 實驗設備………………………………………………………14
    3.5 實驗步驟………………………………………………………16
    3.5.1 鋁鎂合金固溶處理…………………………………………16
    3.5.2 氧化膜生長…………………………………………………16
    第四章 結果與討論………………………………………………17
    4.1 Al-2Mg氧化膜………………………………………………… 17
    4.1.1 試片表面處理………………………………………………17
    4.1.2 Al-2Mg試片的TGA檢測……………………………………17
    4.1.3 Al-2Mg試片的XRD檢測……………………………………17
    4.1.4 掃描式電子顯微鏡(SEM)的觀察…………………………18
    4.1.5 化學分析電子儀(ESCA)的檢測……………………………18
    4.1.6 電子控針微分析儀(EPMA)的檢測…………………………18
    4.2 Al-4Mg氧化膜…………………………………………………19
    4.2.1 試片表面處理………………………………………………19
    4.2.2 Al-4Mg試片的TGA檢測…………………………………… 19
    4.2.3 Al-4Mg試片的XRD檢測……………………………………19
    4.2.4 掃描式電子顯微鏡(SEM)的觀察…………………………20
    4.2.5 化學分析電子儀(ESCA)的檢測……………………………20
    4.2.6 電子控針微分析儀(EPMA)的檢測…………………………20
    4.2.7 Al-2、4Mg氧化膜討論……………………………………21
    4.3 在氮氣氣氛下的Al-2Mg氧化膜………………………………22
    4.3.1 試片表面處理………………………………………………22
    4.3.2 Al-2Mg試片的TGA檢測……………………………………22
    4.3.3 Al-2Mg試片的XRD檢測……………………………………22
    4.3.4 掃描式電子顯微鏡(SEM)的觀察…………………………23
    4.4 在氮氣氣氛下的Al-4Mg氧化膜………………………………24
    4.4.1 試片表面處理………………………………………………24
    4.4.2 Al-4Mg試片的TGA檢測…………………………………… 24
    4.4.3 Al-4Mg試片的XRD檢測……………………………………24
    4.4.4 掃描式電子顯微鏡(SEM)的觀察…………………………25
    4.4.5 氮氣氣氛下Al-2、4Mg氧化膜討論………………………25
    4.5 綜論……………………………………………………………26
    第五章 結論………………………………………………………27
    參考文獻……………………………………………………………28
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    Advisor
  • Teng-Shih Shih(施登士)
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    Date of Submission 2007-07-24

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