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Student Number 942406015
Author Kai Wu(吳鍇)
Author's Email Address kai0425@hotmail.com
Statistics This thesis had been viewed 573 times. Download 414 times.
Department Optics and Photonics
Year 2009
Semester 2
Degree Ph.D.
Type of Document Doctoral Dissertation
Language English
Title Research on optical monitor through optical admittance analysis and dynamic interferometry
Date of Defense 2010-03-10
Page Count 95
Keyword
  • Dynamic interferometer
  • Optical coatings
  • Optical monitor
  • Abstract The optical monitoring method is generally thought better than other methods to manufacture optical filters, and for a costly optical filter manufacture, more precise optical monitor is necessary.
    In a growing thin film stack, the refractive indices of materials usually change so that suitable thickness of each layer would not be the same as what we expected in the original design; hence the termination point of each thin film layer needs to be revised. However, the conventional monitoring methods never analytically solve this problem.
    For the improvement of optical monitor of optical coating productions, the optical behaviors of growing films were analyzed and some simulations were demonstrated in this dissertation. Sensitive monitoring wavelengths were chosen by numerical analysis to achieve precise monitor. Also, the way to find the refractive index change and misjudgment of cutting points (termination point) was derived from a traditional optical monitor structure and the corresponding error compensations were applied to get good output.
    Moreover, a novel optical monitoring system is proposed to extract the temporal phase change of the reflection coefficient of the growing film stacks. A polarization interferometers which frozen the vibration and air turbulence was used in this dissertation to directly detect fluctuating phase and magnitude of the reflection coefficient of a growing film stack as well as the real time optical admittance at normal incidence. It provides a brand new and global monitor method.
    Table of Content 摘要 ........................................................................................... I
    Abstract .................................................................................... II
    Table of Contents ....................................................................... i
    List of Figures .......................................................................... iv
    List of Tables ........................................................................... vii
    Table of Symbols .................................................................... viii
    1. Introduction ...................................................................... 1
    2. Basic Concepts[10] ............................................................. 5
    2.1 Introduction .................................................................................................... 5
    2.2 The transmission and reflection of the single interface ............................... 7
    2.3 Equivalent admittance of the single layer thin film ..................................... 8
    2.4 Equivalent admittance value of a multilayer thin film ............................. 10
    2.5 Optical admittance locus of single layer coating ........................................ 12
    2.6 Optical admittance loci of multi-layer thin films ....................................... 15
    2.7 Reflectance from the uncoated side of substrate ....................................... 15
    3. Conventional Optical Monitor ...................................... 18
    3.1 Introduction .................................................................................................. 18
    3.2 Turning point monitoring method ..............................................................20
    3.3 Level monitoring method ............................................................................. 21
    3.4 Wideband optical monitoring method ........................................................ 25
    3.5 Ellipsometry monitor ................................................................................... 26
    4. Review of Researches on Optical Admittance Monitoring ..................................................................... 29
    4.1 Introduction .................................................................................................. 29
    4.2 Selected sensitive monitor wavelength monitoring method [5] ................ 29
    4.3 Calculations of error compensations from the intersection of next layer admittance circle [6] .............................................................................................. 37
    4.4 Calculation of error compensations from the originally designed phase thickness [7, 8] ........................................................................................................ 39
    4.5 Admittance real-time monitoring through transmittance fitting [4] ....... 42
    5. Sensitivity Analysis on Monitoring Diagram ............... 44
    5.1 Introduction .................................................................................................. 44
    5.2 Sensitivity Calculations for Transmittance/Reflectance Runsheet [23] ... 44
    5.3 Sensitivity on optical admittance diagram monitor .................................. 49
    6. Monitor Refractive Index Change and Thickness Error through Optical Admittance Analysis [24] .................... 57
    6.1 Introduction .................................................................................................. 57
    6.2 Working principle and monitoring strategy .............................................. 57
    6.3 Experiments .................................................................................................. 61
    7. Dynamic Interferometry Monitor System ................... 70
    7.1 Introduction .................................................................................................. 70
    7.2 Working principle and monitoring strategy .............................................. 71
    7.3 Experiments .................................................................................................. 78
    8. Conclusions and Discussion .......................................... 87
    Reference ................................................................................. 89
    APPENDIX A Quartz Monitor[1][2] ..................................... 93
    Reference 1. H. K. Pulker, Coatings on Glass, Elsevier, Amsterdam, Chap. 7, 297-299 (1984).
    2. A. Wajid, “On the accuracy of the quartz-crystal microbalance (QCM) in thin-film depositions,” Sensors and Actuators A 63, 41 (1997)
    3. C.C. Lee and Y.J. Chen, "Multilayer coatings monitoring using admittance diagram," Opt. Exp. 16, 6119 (2008)
    4. C. Zang, Y. Wang, and W. Lu, “A single-wavelength monitor method for optical thin-film coatings”, Opt. Eng. 43, 1439. (2004)
    5. C.C. Lee, K. Wu, C.C. Kuo and S.H. Chen, “Improvement of the optical coating process by cutting layers with sensitive monitor wavelengths”, Optics Express 13, 4854 (2004)
    6. B. Chun, C. K. Hwangbo, and J. S. Kim, “Optical monitoring of nonquarterwave layers of dielectric multilayer filters using optical admittance,” Opt. Express 14, 2473 (2006)
    7. A. V. Tikhonravov, M. K. Trubetskov, and T. V. Amotchkina, “Statistical approach to choosing a strategy of monochromatic monitoring of optical coating production,” Appl. Opt. 45, 7863 (2006)
    8. A. Tikhonravov and M. Trubetskov, “Eliminating of cumulative effect of thickness errors in monochromatic monitoring of optical coating production: theory,” Appl. Opt. 46, 2084 (2007)
    9. R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light, Elsevier Science Pub Co (1987)
    10. 李正中, “薄膜光學與鍍膜技術”, 第五版, 藝軒出版社, 台灣, (2006)
    11. H. A. Macleod, Thin Film Optical Filters, 3nd ed (Inst. of Physics Publishing 2001). Chap. 2
    12. H. A. Macleod, “Turning value monitoring of narrow-band all-dielectirc thin-film optical filters”, Optica Acta 19, 1 (1972)
    13. H. A. Macleod, “Error compensation mechanisms in some thin-film monitor systems”, Opt. Acta 17, 907 (1977)
    14. S. Larouche, A.Amassian, B. Baloukas, and L. Martinu, “Turning-point monitoring is not simply optical thickness compensation”, Optical Interference Coatings Ninth Topical Meeting, TuE8. (2004)
    15. P. Bousquet, A. Fornier, R. Kowalczyk, E. Pwlletier, and P. Roche, “Optical filters: monitoring process allowing the auto-correction of thickness errors”, Thin Solid Films, 13, 285 (1972)
    16. B. Vidal, A. Fornier and E Pelletier, “Wideband optical monitoring of nonquarter wave multilayer filter”, Appl. Opt. 18, 3851. (1979)
    17. C.J. van der Laan, “Optical Monitoring of Nonquarterwave Stacks”, Applied Optics 25, 753 (1986)
    18. H. A. Macleod, “Monitor of optical coatings”, Appl. Opt. 20, 82 (1981)
    19. B. Badoil, F. Lemarchand,* M. Cathelinaud, and M. Lequime” Interest of broadband optical monitoring for thin-film filter manufacturing”, Appl. Opt. 46, 4294 (2007)
    20. S. Wilbrandt, N. Kaiser *, O. Stenzel “In-situ broadband monitoring10. 李正中, “薄膜光學與鍍膜技術”, 第五版, 藝軒出版社, 台灣, (2006)
    11. H. A. Macleod, Thin Film Optical Filters, 3nd ed (Inst. of Physics Publishing 2001). Chap. 2
    12. H. A. Macleod, “Turning value monitoring of narrow-band all-dielectirc thin-film optical filters”, Optica Acta 19, 1 (1972)
    13. H. A. Macleod, “Error compensation mechanisms in some thin-film monitor systems”, Opt. Acta 17, 907 (1977)
    14. S. Larouche, A.Amassian, B. Baloukas, and L. Martinu, “Turning-point monitoring is not simply optical thickness compensation”, Optical Interference Coatings Ninth Topical Meeting, TuE8. (2004)
    15. P. Bousquet, A. Fornier, R. Kowalczyk, E. Pwlletier, and P. Roche, “Optical filters: monitoring process allowing the auto-correction of thickness errors”, Thin Solid Films, 13, 285 (1972)
    16. B. Vidal, A. Fornier and E Pelletier, “Wideband optical monitoring of nonquarter wave multilayer filter”, Appl. Opt. 18, 3851. (1979)
    17. C.J. van der Laan, “Optical Monitoring of Nonquarterwave Stacks”, Applied Optics 25, 753 (1986)
    18. H. A. Macleod, “Monitor of optical coatings”, Appl. Opt. 20, 82 (1981)
    19. B. Badoil, F. Lemarchand,* M. Cathelinaud, and M. Lequime” Interest of broadband optical monitoring for thin-film filter manufacturing”, Appl. Opt. 46, 4294 (2007)
    20. S. Wilbrandt, N. Kaiser *, O. Stenzel “In-situ broadband monitoringof heterogeneous optical coatings,” Thin Solid Films 502, 153 (2005)
    21. S. Dligatch, R. Netterfield, and B. Martin, “Application of in-situ ellipsometry to the fabrication of multilayered coatings with sub-nanometre accuracy,” Thin Solid Films 455-456, 376 (2004)
    22. B. Johs, C. Herzinger , J.H. Dinan, A. Cornfeld, J.D. Benson, D. Doctor , G. Olson, I. Ferguson, et al., “Real-time monitoring and control of epitaxial semiconductor growth in a production environment by in situ spectroscopic ellipsometry,” Thin Solid Films 313–314, 490 (1998)
    23. 吳鍇,“以高靈敏度之監控波長改善光學薄膜之製鍍成效”,國立中央大學光電科學研究所碩士班論文, 2005.
    24. C. C. Lee and K. Wu, “In situ sensitive optical monitoring with proper error compensation”, Optics Letters, 32, 2118 (2007)
    25. B. Kimbrough, J. Millerd, J. Wyant, J. Hayes, “Low Coherence Vibration Insensitive Fizeau Interferometer,” Proc. SPIE 6292, 62920F (2006).
    26. N. Brock, J. Hayes, B. Kimbrough, J. Millerd, M. North-Morris, M. Novak and J. C. Wyant, “ Dynamic interferometry ,” Proc. SPIE 5875 , 58750F (2005).
    27. J. Millerd, N. Brock, J. Hayes, B. Kimbrough, M. Novak, M. North-Morris and J. C. Wyant, “Modern Approaches in Phase Measuring Metrology ,” Proc. of SPIE 5856, 14 (2005)
    28. C. C. Lee, K. Wu, S. H. Chen , and S.R. Ma “Optical monitoring and real time admittance loci calculation through polarization interferometer,” Optics Express, 15, 7536 (2007)
    Advisor
  • Cheng-Chung Lee(李正中)
  • Files
  • 942406015.pdf
  • approve in 2 years
    Date of Submission 2010-07-13

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