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Student Number 92226015
Author Shuan-Wen Wang(王宣文)
Author's Email Address swwang@ios.ncu.edu.tw
Statistics This thesis had been viewed 2642 times. Download 2919 times.
Department Optics and Photonics
Year 2004
Semester 2
Degree Master
Type of Document Master's Thesis
Language zh-TW.Big5 Chinese
Title Anti-Reflection Coating on Plastic Substrate Treated by Low Pressure Plasma
Date of Defense 2005-07-07
Page Count 59
Keyword
  • anti-reflection coating
  • plasma
  • plastic substrate
  • Abstract The application of plastic substrates in optical components increased recently. The limitation in using plastic substrates for optical components was the poor adherence between thin films and substrates. This research focused on plasma surface treatment to enhance the adhesion.
    The change of surface roughness, chemical bonding, substrate transmittance with different gas and pre-treatment power was investigated. In addition, we coated Ta2O5 single layer on substrates after pre-treatment to find out the phenomenon of the inhomogeneity as well as the adhesion degree between Ta2O5 and plastic substrate.
    The results revealed that the improvement of adhesion related to plasma power and pre-treatment time. It took shorter time to reach good adhesion under high plasma power, while longer time under low plasma power. But, high power plasma treatment caused substrate overheated due to the volatile interaction between plasma and substrates. So we chose low power treatment with longer time as well as cathode cooling.
    Finally, it is found that by refining the design of anti-reflection coating with an interface layer, an anti-reflection coating on plastic substrates with good adhesion can be made.
    Table of Content 第一章 前言........1
    1-1 研究動機.......1
    1-2 塑膠基板的種類...1
    第二章 基本理論...4
    2-1 電漿原理......4
    2-1-1 射頻電漿預處理.......5
    2-2 濺鍍原理......6
    2-2-1 直流濺鍍....6
    2-2-2 磁控濺鍍....7
    第三章 量測儀器...9
    3-1 可見光-近紅外光光譜儀...9
    3-2 原子力顯微鏡﹙Atomic Force Microscopy﹚..10
    3-3 傅氏轉換紅外線光譜儀﹙Fourier Transform Infrared Spectroscopy﹚...12
    第四章 研究目標與實驗裝置及流程...13
    4-1 研究目標...13
    4-2 實驗裝置...13
    4-3 實驗流程與方法...15
    第五章 結果與討論...17
    5-1 低功率氬氣電漿預處理...17
    5-1-1 基板穿透率變化...17
    5-1-2基板處理後續鍍Ta2O5之穿透率變化...19
    5-2 低功率氧氣電漿預處理...20
    5-2-1 基板穿透率變化...20
    5-2-2 基板處理後續鍍Ta2O5之穿透率變化...22
    5-3 高功率氬氣電漿預處理...23
    5-3-1 基板穿透率變化...23
    5-3-2 基板處理後續鍍Ta2O5之穿透率變化...24
    5-4 高功率氧氣電漿預處理...25
    5-4-1 基板穿透率變化...25
    5-4-2 基板處理後續鍍Ta2O5之穿透率變化...26
    5-5 FTIR量測基板經由電漿處理後之變化...27
    5-5-1 高功率氬氣電漿處理後之變化...27
    5-5-2 高功率氧氣電漿預處理後之變化...29
    5-6 AFM量測基板經由電漿處理後之表面粗糙度變化...30
    5-6-1 高功率氬氣電漿處理後之變化...30
    5-6-2 高功率氧氣電漿處理後之變化...32
    5-7 附著力測試結果...34
    5-8 抗反射膜之製鍍...35
    5-8-1 四層抗反射膜...35
    5-9 電漿預處理方式之改良...36
    5-9-1 氦氣電漿預處理...36
    5-9-2 以Quartz基板將電漿區與基板隔開...37
    5-9-3 電極冷卻以氦氣與氬氣混合預處理...38
    5-9-4 修正中間層後製鍍四層抗反射膜...39
    第六章 結論...42
    第七章 參考文獻...44
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    Advisor
  • Cheng-Chung Lee(李正中)
  • Files
  • 92226015.pdf
  • approve in 1 year
    Date of Submission 2005-07-20

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