Title page for 91226006


[Back to Results | New Search]

Student Number 91226006
Author Yu-Fu ke(柯育甫)
Author's Email Address kofo6@yahoo.com.tw
Statistics This thesis had been viewed 1991 times. Download 2215 times.
Department Optics and Photonics
Year 2003
Semester 2
Degree Master
Type of Document Master's Thesis
Language zh-TW.Big5 Chinese
Title Free Space Stacked Micro Optical System and Optical Pickup head
Date of Defense 2004-07-02
Page Count 79
Keyword
  • micro optical system
  • optical pickup head
  • Abstract 本論文利用現有半導體製程技術與微光機電製程技術,製作矽基堆疊式微光學元件,應用於微型化光學讀取頭,使其簡單化、微小化及積體化。本光學讀取頭包含650nm雷射二極體、45o反射面鏡、光柵、全像光學元件與Fresnel lens等,以自由空間堆疊方式整合各光學元件,以達到將光束聚焦於光碟片上,並產生接近繞射極限的聚焦點,同時以三光束法與像散法產生聚焦及循軌誤差訊號,由光偵檢器接收其光訊號。
      在各光學元件的製程方面,自由空間矽基堆疊式光學元件是利用低壓化學氣相沉積(LPCVD)的方法,在單晶矽基板上沉積低應力氮化矽薄膜,利用感應耦合電漿蝕刻機(ICP) 以乾式蝕刻的方式,控制氮化矽蝕刻的輪廓和深度;並以氮化矽薄膜作為保護層,利用氫氧化鉀水溶液以濕式蝕刻單晶矽的方法製作光通道。本光學系統採用半導體製程技術製作,因此可以整批大量製造來降低製造成本,以表面微加工技術與體型微加工技術來縮小系統尺寸、減輕系統重量。
    Table of Content 目  錄
    論文摘要I
    目錄II
    圖索引III
    表索引IX
    第一章 緒論1
    1-1光學讀取頭2
    1-2微型化讀取頭的類別3
    1-3結論7
    第二章 自由空間堆疊式微光學元件與系統11
    2-1光學讀取頭之聚焦與循軌11
    2-2繞射理論簡介12
    2-3光柵14
    2-4Fresnel lens16
    2-5全像光學元件18
    2-6自由空間堆疊型微光學讀取頭20
    第三章 微光學元件之製作26
    3-1 微光學元件之製作流程26
    3-2 薄膜沉積28
    3-3 微影製程30
    3-4 蝕刻製程34
    第四章 微光學元件量測與封裝53
    4-1 SiNx光柵量測53
    4-2 SiNxHy光柵量測54
    4-3 全像光學元件量測55
    4-4 非球面Fresnel lens量測56
    4-5 光學系統組裝57
    4-6 光學讀取頭系統量測59
    第五章 結論67
    參考資料 68
    Reference [1] M. Edward Motamedi, “Micro-Opto-Electro-Mechanical Systems”, Opt. Eng., 36, pp.1280-1281, 1997.
    [2] 施錫富, “全像光學元件在光學讀取頭上應用之研究”, 1999.
    [3] S. Ura, T. Suhara, H. Nishihara, and J. Koyama, “An Integrated-optic Disk Pickup Device”, J. of Lightwave Tech., Vol. LT-4, No.7, p.913, 1986.
    [4] T. Shiono and H. Ogawa, “Planar-optic-disk Pickup with Diffractive Micro-optics”, Appl. Opt., Vol.33, No.31, p.7350, 1994.
    [5] Hans Peter Herzig, “Micro-optics”, Taylor and Francis, 179-198.
    [6] L. Y. Lin, J. L. Shen, S. S. Lee, and M. C. Wu, “Realization of novel monolithic free-space optical disk pickup heads by surface micromachining”, Opt. Lett., 21, pp.155-157, 1996.
    [7] 李金萍, “極化繞射元件在高密度光學讀取頭上之應用研究”, 26-27, 2000 .
    [8] M. Bass, “Handbook of Optics II”, Chapter 7, 1995.
    [9] L. d’AURIA, “Photolithographic Fabrication of Thin Film Lenses, Optics Communications”, Vol.5, No.4, pp.232-235, 1972.
    [10] Wai-Hon Lee, “Holographic optical head for compact disk applications”, Opt. Eng., Vol.28, No.6, pp.232-235, 1989.
    [11] 莊達仁, “ VLSI 製造技術”, 2002.
    [12] J. Bhardwaj, H. Ashraf, J. Hopkins, I. Johnston, S. McAuley, S. Hall, G. Nicholls, L. Atabo, A. Hynes, C. Welch, A. Barker, B. Gunn, L. Lea, E. Guibarra, S. Watcham, “Advances in High Rate Silicon and Oxide Etching using ICP.”
    [13] J. Kiihamaki, H. Kattelus, J. Karttunen, S. Franssila, “Depth and profile control in plasma etched MEMS structure”, Sensors and Actuators, 82, 234-238, 2000.
    [14] Masafumi Ito, Kiyoshi Kamiya, Masaru Hori, and Toshio Goto, “Substrute reactions of Silicon nitride in a highly selective etching process of silicon oxide over silicon nitride”, J, of Appl. Phy., Vol.91, No.5, pp.3452-3458, 2002.
    [15] R. Ramesham, C. D. Ellis, J. D. Olivas, S. Bolin, “Fabrication of diamond membrances for MEMS using reactive ion etching of silicon”, Thin Solid Films 330, pp.62-66, 1998.
    [16] Marc Madou, Fundamentals of microfabrication, CRC Press, “Wet Bulk Micromachining”, pp.145-215, 1997.
    [17]J. T. Sheu, K. S. You, C. H. Wu, and K. M. Chang, “Optimization of KOH Wet Etching Process in Silicon Nitride Nanofabrication”, IEEE Nano, 29, pp.213-217, 2001.
    [18] R. M. Tiggelaar, T. T. Veenstra, R. G. P. Sanders, J. G. E. Gardeniers, M. C. Elwenspoek, A. Van and Berg, “A light detection cell to be used in a micro analysis system for ammonia”, Talanta 56, pp.331-339, 2002.
    [19] Masayuki Sekimura, “Method for manufacturing a functional device by forming 45-degree surface on (100)silicon” , Patent No.:US 6,417,107 B1, 9, 2002.
    [20] Irena Zubel, Malgorzata Kramkowska, “The effect alcohol additives on etching characteristics in KOH solutions, Sensors and Actuators A 101, 225-261, 2002.
    Advisor
  • Jeng-Yang Chang(張正陽)
  • Files
  • 91226006.pdf
  • approve in 1 year
    Date of Submission 2004-07-09

    [Back to Results | New Search]


    Browse | Search All Available ETDs

    If you have dissertation-related questions, please contact with the NCU library extension service section.
    Our service phone is (03)422-7151 Ext. 57407,E-mail is also welcomed.