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Student Number 90323081
Author Cheng-Pin Yang(楊正斌)
Author's Email Address s0323081@cc.ncu.edu.tw
Statistics This thesis had been viewed 1539 times. Download 11 times.
Department Mechanical Engineering
Year 2002
Semester 2
Degree Master
Type of Document Master's Thesis
Language zh-TW.Big5 Chinese
Title 流體黏度對旋塗減量之影響
Date of Defense 2003-06-27
Page Count 87
Keyword
  • spin coating
  • spiral
  • Abstract 摘要
    現今科技的不斷發展,使得半導體工業方面的製程也不斷的改進,以往使用在8吋以下晶圓的旋塗均是由中心點注入流體,達到塗佈的目的,但隨晶圓面積加大所需的流體原料相對也須增加,如此將造成原料大量浪費增加成本,且將會造成環境污染。在本實驗中採用兩種不同,第一部分為靜置後旋轉(Release)塗佈模式,第二部份為移動注液(Mobile Injection)塗佈模式,經由實驗後發現在使用黏度較高的流體時,採用第一種方式將需要更多的原料使晶圓表面塗滿,因此,我們需要不同的旋轉塗佈模式來改進這些缺點。實驗的第二部分為在旋轉塗佈時改變注入流體的噴嘴的位置,不同於以往在中心點位置注入,我們改變噴嘴的位置,在塗佈過程的初始階段,晶圓利用低轉速旋轉並移動噴嘴使之從中心向外移動,產生螺旋紋的原料,再經由加速使流體向外擴張並均勻的塗佈於晶圓表面,在實驗中我們改變晶圓轉速、噴嘴移動速度及注液速率獲得最佳的塗佈模式,如此將可節省許多原料浪費,並進一步提供半導體業界參考。
    Table of Content 目錄
    摘要.....I
    致謝.....III
    目錄.....IIII
    表目錄...V
    圖目錄...VI
    符號說明表........XI
    第一章 緒論.......1
    1-1  前言.......1
    1-2  文獻回顧...2
      1-2.1 旋轉塗佈之相關文獻回顧....2
      1-2.2 風剪效應相關文獻回顧......5
      1-2.3 不穩定手指狀流之相關文獻回顧........7
    第二章 實驗設備與方法......11
    2-1 注液系統簡介..........11
    2-2 旋塗轉速控制系統......12
    2-3 影像擷取系統..........14
    2-4 實驗方法...............15
    第三章 結果與討論..........18
    3-1 靜置後旋轉對旋塗液模擴展之影響...........18
      3-1.1 不穩定手指狀流的生成......18
      3-1.2 科氏力對不穩定手指狀流的影響.......19
      3-1.3 靜置後旋轉液膜擴展情形.....21
    3-2 螺旋波紋塗佈模式對旋轉塗佈的影響........23
      3-2.1 螺旋波紋塗佈模式參數的決定.........23
           3-2.2 使用不同黏度的矽油測試螺旋波紋塗佈模式是
               否可行.........25
    第四章 結論......28
    參考文獻..........31
    附表.....38
    附圖.....39
    Reference 參考文獻
    1. A. G. Emsilie, F. T. Bonner, and L. G. Peck, Flow of a Viscous Liquid on a Rotating Disk, J. Appl. Phys., Vol. 29, pp. 858-863(1958).
    2. E.Momoniat, D.P. Mason, Investigation of the Coriolis Force ona Thin Fluid Film on a Rotating Disk, Int. J. Non-Linear Mech., Vol 31, No. 6, pp. 1069-1088, (1998).
    3. M. Yanagisawa, Slip Effect for Thin Liquid Film on a Rotating Disk, J. Appl. Phys., Vol. 61, pp. 1034-1037(1978).
    4. A. Acrivos, M. Shan and E. E. Petersen, On the Flow of a Non-Newtonian Liquid on a Rotating Disk, J. Appl. Phys., Vol. 31, pp. 963-968(1960).
    5. D. E. Bornside, C. W. Maccsko, and L.E., Scriven, Spin Coating: One-Dimensional Model, J. Appl. Phys., Vol. 66, pp. 5185-5193(1989).
    6. M. L. Forcada, and C. M. Mate, The Flow of Thin Lubricant Films on Rotating Disks, Wear, Vol. 168, pp. 21-25(1993).
    7. D. Meyerhofer, Characteristics of Resist Films Produced by Spinning, J. Appl. Phys., Vol. 49,pp. 3993-3997(1978).
    8. T. Yada, T. Maejima, M. Aoki, and M.Umesaki, Thin-Film Formation by Spin Coating: Characteristics of a Positive Photoresist, Jpn. J. Appl. Phys., Vol. 34, pp. 6279-6284,(1995).
    9. T. Yada, T. Maejima, and M. Aoki, Formation of a Positive Photoresist Thin Film by Spin Coating: Inflfence of Atmospheric Humidity, Jpn. J. Appl. Phys., Vol. 36, pp. 7041-7.47,(1997).
    10. T. Yada, T. Maejima, M. Aoki, and A. Ishizu, Formation of a Positive Photoresist Thin Film by Spin Coating: Influence of Atmospheric Temperature, Jpn. J. Appl. Phys., Vol. 36, pp. 372-377,(1997).
    11. T. Yada, Formation of a Negative Photoresist Thin Film by Spin Coating, Jpn. J. Appl. Phys., Vol. 37, pp. 2752-2757,(1998).
    12. W. W. Flack, D. D. Soong, A. T. Bell, and D. W. Hess, A Mathematical Model for Spin Coating of Polymer Resist, J. Appl. Phys., Vol. 56, pp. 1199-1206,(1984).
    13. B. G. Higgins, Film Flow on a Rotating Disk, Phys, Fluids, Vol. 29, pp. 3522-3529,(1986).
    14. C. T. Wang, and S. C. Yen, Theoretical Analysis of Film Uniformity in Spinning Processes, Chem. Eng. Sci., Vol. 50, pp. 989-999,(1995).
    15. J. H. Hwang, and F. Ma, On the Flow of a Thin Liquid Film over a n Rough Rotating Disk, J. Appl. Phys., Vol. 66, pp. 388-394,(1989).
    16. F. Ma, and J. H. Hwang, The Effect of Air Shear on the Flow of a Thin Liquid Film over a Rough Rotating Disk, J. Appl. Phys., Vol. 112, pp. 165-168,(1990).
    17. J. Gu, M. D. Bullwinkel, and G. A. Campbell, J. Electrochem. Soc., Vol. 142, pp. 907-913,(1995).
    18. R. K. Youkoski, and D. S. Soane, Model for Spin Coating in Microelectronic Applications, J. Appl. Phys., Vol. 72, pp. 725-740,(1992).
    19. S. Middleman, The Effect of Induced Air-Flow on the Spin Coating of Viscous Liquids, J. Appl. Phys., Vol. 62, pp. 2530-2532,(1987).
    20. F. Ma, and J. H. Hwang, The Effect of Air Shear on the Flow of a Thin Liquid Film over a Rough Rotating Disk, ASME J. Appl. Phys., Vol. 112, pp. 165-168,(1990).
    21. T. J. Rehg, and B. G. Higgins, The Effect of Inertia and Interfacial Shear on Film Flow on A Rotating Disk, Phys. Fluids, Vol. 31, pp. 1360-1371,(1988).
    22. W. H. McConnell, On the Rate of Thinning of Thin Liquid Films on a Rotating Disk, J. Appl. Phys., Vol. 64, pp. 2232-2233,(1988).
    23. M. Yanagisawa, Slip Effect for Thin Liquid Film on a Rotating Disk, J. Appl. Phys., Vol. 61, pp. 1034-1037,(1987).
    24. S. C. Gong, and F. C. Chou, Effect of Wind shear on the Film Thickness Distribution over Rotating Doughnut Disks, Jpn. J. Appl.Phys., Vol. 36, pp. 380-384,(1997).
    25. F.C. Chou and P.Y. Wu, Effect of Air Shear on Film Planarization during Spin Coating, J. Electrochem. Soc., Vol. 147, pp. 699-705,(2000).
    26. L. W. Schwartz, Viscous flow down an inclined plane:Instability and finger formation, Phys. Fluids A, Vol. 1, No. 3, pp. 443-445,(1989).
    27. S. M. Troian, E. Herbolzheimer, S. A. Safran and J. F. Joanny, Fingering Instabilities of Driven Spreading Films, Europhys. Lett., 10(1), pp. 25-30,(1981).
    28. F. Melo, J. F. Joanny, and S. Fauve, Fingering Instability of Spinning Drops, Phys. Review Letters, Vol. 63, pp. 1958-1961,(1989).
    29. N. Fraysse, and G. M. Homsy, An Experimental Study of Rivulet Instabilities in Centrifugal Spin Coating of Viscous Newtonian and Non-Newtonian Fluids, Phys. Fluids, Vol. 6, pp. 1491-1504,(1994).
    30. M. A. Spaid and G. M. Homsy, Stability of Viscoelastics Dynamic Contact Lines: An Experiment Study, Phys. Fluids, Vol. 9, pp. 823-834,(1997).
    31. S. K. Wilson, R. Hunt, and B. R. Duffy, The Rate of Spreading in Spin Coating, J. Fluid Mech., Vol. 413, PP. 65-88,(2000).
    32. F. C. Chou, S. C. Gong, M. W. Wang, and K. T. Lie, On the Reduction Liquid Dispensed in Spin Coating, ASME FED- 239, Proc. 1996, ASME Fluids Engineering Division Summer Meeting, pp. 553-558, San Diego, CA. ,(1996).
    33. F. C. Chou, S. C. Gong and M. W. Wang, Reduction of Photoresist Usage during Spin Coating, Journal of Electronic Materials, Vol 30, No. 4, pp. 432-438,(2001).
    34. 周復初,卓浩江和王明文,轉速對旋轉塗佈液膜穩定的影響,中國機械工程學會第十六屆全國學術研討會,第五冊 pp. H049-H054,中華民國八十八年十二月.
    35. F. C. Chou, H. J. Juo, M. W. Wang and S. J. Dai, Effect of Injection Rate on Fingering Instabilities during Spin Coating, Procs. of 8th International Symposium on Transport Phenomena and Dynamics of Rotating Machinery (ISROMAC-8), Vol. 2, pp. 500-505,(2000).
    36. F. C. Chou and M. W. Wang, Photoresist Spin Coating on 300 mm Wafer, Procs. 15th National Conf. on Mech. Engng, CSME, pp. 209-216, Tainan, ROC.
    37. F.C. Chou, P.Y. Wu, and S.C. Gong, Analytical Solutions of Film Planarization during Spin Coating, Jpn. J. Appl. Phys., Vol. 37, pp. 4321-4327,(1998).
    38. P.Y. Wu and F.C. Chou, Complete Analytical Solutions of Film Planarization during Spin Coating, J. Electrochem. Soc., Vol. 146, pp. 3819-3826,(1999).
    39. M. W. Wang, H. K. Yu, and F. C. Chou, Effect of A Prewetting Thin Film on Fingering Instabilities During Spin Coating, The 3rd Pacific Symposium on Flow Visualization & Image Processing, F3058, 1-7, Maui Hawaii, USA. (2001).
    Advisor
  • Fu-Chu Chou(周復初)
  • Files
  • 90323081.pdf
  • disapprove authorization
    Date of Submission 2003-07-08

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