Title page for 85226009


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Student Number 85226009
Author chien-cheng Kuo(郭倩丞)
Author's Email Address No Public.
Statistics This thesis had been viewed 348 times. Download 11 times.
Department Optics and Photonics
Year 1997
Semester 2
Degree Master
Type of Document Master's Thesis
Language zh-TW.Big5 Chinese
Title Bandpass filiter deposited with plasma ion-assisted deposition
Date of Defense 0000-00-00
Page Count 68
Keyword
  • bandpass
  • ion-assisted deposition
  • Abstract
    Table of Content 摘要 1
    目錄 2
    圖目錄 5
    表目錄 7
    符號表 8
    1. 緒論 9
    1.1 離子助鍍法對薄膜的影響 11
    1.1.1 一般熱蒸鍍及電子鎗蒸鍍法之缺點 12
    1.1.2 離子助鍍法的優點 13
    2. 基本理論 14
    2.1 蒸鍍參數 14
    2.1.1 離子束之能量 14
    2.1.2 離子束之電流密度 14
    2.1.3 原子與離子的比值 15
    2.1.4 基板溫度 16
    2.1.5 充氧量 16
    2.2 堆積密度(Packing Density) 16
    2.3 光學常數的計算方法 19
    2.4 矽膜(Si)氧化物之比較 21
    2.5 矽膜(Si)氧化程度之計算方法 22
    2.6 帶通濾光片 24
    3. 實驗架構 28
    3.1 蒸鍍系統 28
    3.1.1 真空系統 28
    3.1.2 材料蒸發系統 28
    3.1.3 離子源輔助蒸鍍系統 29
    3.1.4 監控系統 29
    3.2 離子源(ion source) 32
    3.2.1 離子源工作原理 32
    3.2.2 離子源產生離子束 35
    3.3 量測儀器 36
    3.3.1 可見光/近紅外光光譜儀 36
    3.3.2 紅外光光譜儀 36
    4. 實驗結果與討論 39
    4.1 蒸鍍矽膜(Si) 39
    4.1.1 基板加熱對Si的影響 39
    4.1.2 離子束能量對Si的影響 40
    4.1.3 離子束電流密度對Si的影響 42
    4.2 蒸鍍二氧化矽膜(SiO2) 46
    4.2.1 充氧氣(O2)對Si的影響 46
    4.2.2 在離子源中充氧氣(O2)對Si的影響 51
    4.3 蒸鍍結果 54
    4.3.1 蒸鍍Si膜 54
    4.3.2 蒸鍍SiO2膜 55
    5. 應用 59
    6. 結語 63
    7. 參考文獻 67
    Reference 1 G. M. Wolf, K. Zucholl, M. Barth, and W. Ensinger, "Equipment for ion beam assisted deposition," Nucl. lnstrum. Methods B21, (1987), p.570.
    2 S. Ogura and H. A. Macleod, "Water sorption phenomena in optical thin films," Thin Solid Films 34, (1976), p.163.
    3 P. J. Martin, H. A. Macleod, R. P. Netterfiled, C. G. Pacey and W. G. Sainty, "Ion-bearn-assisted deposition of tin films," AppI. Opt. 22, (1983), p.178 . .j
    A. Zoller, R. Gotzelmann, H.Hagedorn, W. Klug, K. Mati, "Plasma ion assisted deposition: a powerful technology for the production of optical coatings,"SPIE, Vol.3133, San Diego, (1997), p.l96.
    5 A. Zoller, R. Gotzelmann, k. MatI, "Shift free interference coatings deposited with plasma ion assisted deposition" OIC 95, Tucson Arizona, (1995), TuA7, p.l04.
    6 A. Zoller, R. Gotzelmann, k. Mati, and D. Cushing, "Temperature stable bandpass filters deposited with plasma ion assisted deposition," AppL Optics, Vol 35, No.28, (1996), p.5609.
    7 Y. Qu, T. A. Gessert, T. J. Coutts, and R. Noufi, "Study of ion-beamsputtered ZnO films as a function of deposition temperature," J. Vac. Sci. TechnoL A, 12,4, (1994), p.1507.
    8 Wayne G. Sainty, R. P. Netterfiled, and Philip 1. Martin, "Pretective dielectric coatings produced by ion-assisted deposition," Appl. Optics vol.23, No.7, (1984), p.1116.
    9 K. H. Guenther, "Physical and chemical aspects in the application of thin film on optical elements," Appl. Opt. 23, (1984), p.3612.
    10 K. H. Guenther, and H. K. Pulker, "Electron microscopic investigation of cross sections of optical thin films," Appl. Opt. 15, (1976), p.2992.
    11 H. K. Pulker and E. Jung, "Correlation between film structure and sorption behaviors of vapor deposited ZnS, cryolite and MgF2 films," Thin Solid Films 9, (1971), p.57.
    12 H. Demiryont, James R. Sites and Kent Geib, "Effects of oxygen content on the optical properties of tantalum oxide films deposited by ion-beam sputtering", Appl. Opt. 24, (1985), p.490.
    13 H. Demiryont, 1. R. Sites, and K. Geib, "Effects of oxygen content on the optical properties of tantalum oxide films deposited by ion-beam sputtering," Appl. Opt. 24, 4, (1985), p.490.
    14 唐晉發,顧培夫, "薄膜光學與技術" , 機械工業出版社,147 (1989)
    15 G. W. Vogl, K. H. Monz, Q. D. Nquyen, M. Huter, E. P. Rille, "Silicon-and Aluminum-Nitride Films Deposited by Reactive Low Voltage Ion Plating and Reactive DC-Magnetron Sputtering," SPIE, Vol.2253, (1994), p.1275.
    16 S. K. Ray, S. Das, C. K. Maiti, S. K. Lahiri, And N. B. Chakrabarti, "Deposition of composition-controlled silicon oxynitride films by dual ion beam sputtering," Appl. Phys. Letter. 58(22), (1991), p.2476.
    17 W. Heitmann, " Properties of Evaporated Si02, SiOxNy, and Ti02, Films," Appl. Optics vol. 10 No.12, (1971), p.2685.
    18 E. Dehan, P. Temple-Boyer, R. Henda, 1. J. Pedroviejo, E. Scheid, "Optical and structural properties of SiOand SiNx materials," Thin x Solid Films 266, (1995), p.14.
    19 H. R. Kaufman, and R. S. Robinson, "Operation of broad-beam sources," Part one, IV, Fort Collins, Colorado, USA (1984).
    20 H. R. Kaufman and R. S. Robinson, "Operation of broad-beam sources," Commonwealth Scientific Corporation (1987).
    21 John R. McNeil, G. A. AI-Jumaily, K. C. Jungling, and A. C. Barron, "Properties of Ti02 and Si02 thin films deposited using ion assisted deposition," Appl. Optics. Vol.24, No.4, (1985), p.486.
    Advisor
  • C. C. Lee(李正中)
  • Files No Any Full Text File.
    Date of Submission

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